Nano-Characterization Lab
The Nano-Characterization Lab facility offers state-of-the-art services for the characterization of nanomaterials and nanostructures developed at ICFO, within the various groups as well as in the nanofabrication facility (NFL).
NCL’s unique equipment facilities provides multiple characterization techniques for imaging optoelectronic materials, nanophotonic structures and devices thereof on multiple length-scales using photons, electrons, mechanical forces as well as x-rays as probes.
NCL Chair
Prof. Gerasimos Konstantatos
Operations Manager
Dr. Johann Osmond
Available techniques
Electron Microscopy
The facility offers a state-of-art electron microscopy suite with currently 2 SEMs one offering Ultra-high resolution at high and low beam energies for surface sensitive samples.
X-ray diffraction Facility
NCL also has An X-ray diffraction facility for powder and thin film measurements, featuring also X-ray reflection for thin film measurements.
Spectroscopic Ellipsometry
NCL’s spectroscopic ellipsometry covering a very broad spectral range from 300 nm – 20 μm, provides unprecedented information on the optical properties of materials and photonic structures at such a broad range.
Scanning Probe Microscopy
NCL provides several state-of-art scanning probe microscopy systems offering several techniques including AFM, (photo-)conductive AFM, Kelvin-probe AFM, scanning-CAP AFM etc.
Collaborations
Research Infrastructures
The Nano Characterization Lab forms part of the following research Infrastructure
In order to request access, detailed information on the available equipments and fees, please contact: gerasimos.konstantatos@icfo.eu; johann.osmond@icfo.eu
Current Fees